Industrial Metallurgical Microscope XJP-607A

JP-607A industrial microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds and observe thicker specimen. High quality and reliable optical system brings much clearer and contrast image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.

    Description

    JP-607A industrial microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds and observe thicker specimen. High quality and reliable optical system brings much clearer and contrast image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.

    Specification

    Viewing Head
    Compensation Free Trinocular Head, Inclined 30°(50mm-75mm)
    Eyepiece
    WF10×/25mm
    WF10×/20mm,crosshair with reticule 0.1mm
    Objective
    Long working distance Infinite Plan Apochromatic objectives:5
    ×/0.15/W.D.35mm、10×/0.28/W.D.35mm、20×/0.40/W.D.20mm、50
    ×/0.55/W.D.13mm
    Nosepiece
    Quadruple nosepiece with center adjustable
    Stage
    Double layer mechanical stage
    Stage Size: 190mm×140mm
    Moving Range:50mm×40mm
    Filter
    Flashboard type Filters:(green,blue,neutral)
    Focusing
    Coaxial coarse &fine focusing adjustment with rack and pinion mechanism.Fine
    focusing scale value 0.002mm
    Light Source
    With aperture iris diaphragm and field iris diaphragm,halogen bulb 12V/50W, AC
    85V-230V, brightness adjustable
    Polarizing Device
    Analyzer rotatable 360,°Polarizer&Analyzer can be moved in/out of the optical path
    Checking Tool
    0.01mm Micrometer
    Optional Accessory
    Two-dimensional measurement software
    Professional metallurgical image analysis software
    Micrometer eyepiece
    1.3Mega、2.0 Mega、3.0 Mega,5.0 Mega pixels CMOS. Digital camera eyepieces
    Halogen Bulb 12V/100W
    Precision Stage:X-Y moving range 25mm×25mm,Moving Precision<5um,Digital
    hand wheel Min.Value:0.1um,360°Rotatable disc
    Photography attachmentand CCD Adapter 0.5×、0.57×、0.75×
    Objective: 2×
    Planishing tool
    CCD Camera,colour 1/3″High resolution 520 TV lines

    Characteristicsand Description

    1. Adopt UIS High-resolution, Long working distance, and infinity light path
    correcting system objective imaging technology.
    2. Extending the multiplexing technology of objective, compatible infinity
    objective with all the observation methods.
    3. Aspherical surface Kohler illumination, increasing the viewing brightness.
    4. WF10×(Φ25)super wide viewing field Eyepiece.
    Micrometer Eyepiece is accessory for a variety of optical measuring instruments ,when assembled on an appropriate optical instrument, it can be used for various measurements, such as measuring the holes′distance, width and length of the graduation scale and keyways, metal surface quality, spectrum bandwidth, the density of fiber fabric and the field specimens and so on, it can also measure the size of indentation and scratch as accessory of some micro hardness tester.

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