Metallurgical Microscope XJP-158J
XJP-158J Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry, Used as an advanced Metallurgical microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds. This instrument adopts both reflecting and transmitted illumination, Bright＆Dark field, DIC and Polarizing observation can proceed under reflecting illumination, and the Bright field observation is done under transmitted light. High quality and reliable optical system brings much clearer and sharper image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.
Description
XJP-158J Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry, Used as an advanced Metallurgical microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds. This instrument adopts both reflecting and transmitted illumination, Bright＆Dark field, DIC and Polarizing observation can proceed under reflecting illumination, and the Bright field observation is done under transmitted light. High quality and reliable optical system brings much clearer and sharper image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.
Specification
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Viewing Head
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Compensation Free Trinocular Head, Inclined 30°（50mm-75mm）
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Eyepiece
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WF10×/25mm
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WF10×/20mm,crosshair with reticule 0.1mm
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Objective
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Long working distance bright＆dark field Infinity.Plan Objectives:
5×/0.1B.D/W.D.29.4mm、10×/0.25B.D/W.D.16mm、
20×/0.40B.D/W.D.10.6mm、40×/0.60B.D/W.D.5.4mm、
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Nosepiece
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With DIC Jack Quadruple Nosepiece
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Stage
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Double layer mechanical stage
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Stage Size: 189mm×160mm
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Moving Range:80mm×50mm
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Filter
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Flashboard type Filters (green,blue,neutral)
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Condenser
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N.A.1.25 Abbe Condenser with iris diaphragm and filter
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Focusing
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Coaxial coarse ＆fine focusing adjustment with rack and pinion mechanism.Fine
focusing scale value 0.002mm
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Light Source
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Transmission Illumination: Halogen Bulb 12V/50W,AC85V-230V, Brightness Adjustable
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Epi-illumination:With aperture iris diaphragm and field iris diaphragm, halogen
Bulb 12V/50W,AC85V-230V, Brightness Adjustable
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Polarizing Device
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Analyzer 360°rotatable,both Polarizer and Analyzer can be moved out of the light path
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Checking Tool
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0.01mm Micrometer
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Optional Accessory
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Two-dimensional measure software
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Professional metallurgical image analysis software
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Epi-illumination:Halogen Bulb 12V/100W,AC85V-230V, Brightness Adjustable
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Long working distance bright ＆ dark field Infinite Planobjectives:
50×/0.55B.D/W.D.5.1mm、80×/0.75B.D/W.D.4mm、100×/0.80B.D/W.D.3mm
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micrometer eyepiece
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1.3Mega、2.0 Mega、3.0 Mega,5.0 Mega pixels CMOS Digital camera eyepieces
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Photography attachmentand CCD Adapter 0.5×、0.57×、0.75×
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DIC（10×、20×、40×、100×）
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Planishing tool
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CCD Camera,colour 1/3″High resolution 520 TV lines
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Characteristicsand Description
- Adopt UIS High-resolution, long working distance, and infinity light path
correcting system objective imaging technology
- Extending the multiplexing technology of objective, compatible infinity
objective with all the observation methods, including bright＆dark field
observation, polarization and DIC also provide with high clear and sharp
image in each observation method.
- Aspherical surface Kohler illumination, increasing the viewing brightness.
- WF10×（Φ25）Super wide viewing field Eyepiece, long working distance
metallurgical objective with bright and dark field
- The Nosepiece can be equipped with detachable DIC differential interference
device.
